| Document Type
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BL
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| Record Number
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564531
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| Doc. No
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b393750
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| Title & Author
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Handbook of VLSI microlithography : principles, technology, and applications /\ edited by John N. Helbert.
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| Edition Statement
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2nd ed.
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| Publication Statement
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Park Ridge, N.J. :: Noyes Publications ;Norwich, N.Y. :: William Andrew Pub.,, c2001.
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| Series Statement
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Materials science and process technology series. Electronic materials and process technology.
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| Page. NO
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1 online resource (xxi, 1001 p.) :: ill.
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| ISBN
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1591242754 (electronic bk.)
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: 9781591242758 (electronic bk.)
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: 9780815514442
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: 0815514441
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: 9780815517795 (electronic bk.)
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: 0815517793 (electronic bk.)
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9780815517801
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| Bibliographies/Indexes
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Includes bibliographical references and index.
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| Contents
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Issues and Trends Affecting Lithography Tool Selection Strategy -- Resist Technology: Design, Processing and Applications -- Lithography Process Monitoring and Defect Detection -- Techniques and Tools for Photo Metrology -- Techniques and Tools for Optical Lithography -- Microlithography Tool Automation -- Electron Beam ULSI Applications -- Rational Vibration and Structural Dynamics for Lithographic Tool Installations -- Applications of Ion Microbeam Lithography and Direct Processing -- X-Ray Lithography.
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| Abstract
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This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge, and pattern feature dimension control. The book's explanation of resist and resist process equipment technology describes the relationship between the resist process and equipment parameters. The basics of resist technology are also covered - including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.
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| Subject
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Integrated circuits-- Very large scale integration.
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| Subject
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Microlithography.
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| Dewey Classification
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621.3815/31
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| LC Classification
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TK7874.H3494 2001eb
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| Added Entry
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Helbert, John N.
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| Added Entry
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Knovel (Firm)
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