رکورد قبلیرکورد بعدی

" Principles of lithography / "


Document Type : BL
Record Number : 568472
Doc. No : b397691
Main Entry : Levinson, Harry J.
Title & Author : Principles of lithography /\ Harry J. Levinson.
Edition Statement : 3rd ed.
Publication Statement : Bellingham, Wash. :: SPIE Press,, c2010.
Series Statement : SPIE Press monograph ;; PM 198
Page. NO : xiii, 494 p. :: ill. (some col.) ;; 26 cm.
ISBN : 9780819483249
: : 0819483249
: : 9780819483256
Bibliographies/Indexes : Includes bibliographical references and index.
Contents : Preface to the third edition -- Preface to the second edition -- Preface -- Overview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin-film effects -- Wafer steppers -- Overlay -- Masks and reticles -- Confronting the diffraction limit -- Metrology -- Immersion lithography and the limits of optical lithography -- Lithography costs -- Extreme ultraviolet lithography -- Alternative lithography techniques -- Appendix A: Coherence.
Abstract : The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Subject : Integrated circuits-- Design and construction.
Subject : Microlithography.
Added Entry : Society of Photo-optical Instrumentation Engineers.
Parallel Title : Lithography
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