رکورد قبلیرکورد بعدی

" Ion implantation technology-92 "


Document Type : BL
Record Number : 572197
Doc. No : b401416
Main Entry : International Conference on Ion Implantation Technology(9th :1992 :, Gainesville, Fla.)
Title & Author : Ion implantation technology-92 : proceedings of the Ninth International Conference on Ion Implantation Technology, Gainesvile, FL, USA, September 20-24, 1992 /\ editors, D.F. Downey ... [et al.].
Publication Statement : Amsterdam ;New York :: North-Holland,, 1993.
Page. NO : 1 online resource (xvii, 697 p.) :: ill.
ISBN : 9780444599803
: : 0444599800
: 0444899944
: 9780444899941
Bibliographies/Indexes : Includes bibliographical references and index.
Abstract : Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
Subject : Semiconductors, Congresses.
Subject : Ion implantation, Congresses.
Subject : Semiconductor doping, Congresses.
Subject : TECHNOLOGY ENGINEERING / Electronics / Semiconductors.
Subject : TECHNOLOGY ENGINEERING / Electronics / Solid State.
Added Entry : Downey, D. F.
Added Entry : ScienceDirect (Online service)
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