|
" Rapid Thermal Processing of Semiconductors "
by Victor E. Borisenko, Peter J. Hesketh.
| Document Type
|
:
|
BL
|
| Record Number
|
:
|
575619
|
| Doc. No
|
:
|
b404838
|
| Main Entry
|
:
|
Borisenko, V. E., (Viktor Evgenʹevich)
|
| Title & Author
|
:
|
Rapid Thermal Processing of Semiconductors\ by Victor E. Borisenko, Peter J. Hesketh.
|
| Publication Statement
|
:
|
Boston, MA :: Springer US :: Imprint: Springer,, 1997.
|
| Series Statement
|
:
|
Microdevices, Physics and Fabrication Technologies
|
| ISBN
|
:
|
9781489918048
|
|
|
:
|
: 9781489918062
|
| Contents
|
:
|
1. Transient Heating of Semiconductors by Radiation -- 2. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals -- 3. Crystallization, Impurity Diffusion, and Segregation in Polycrystalline Silicon -- 4. Component Evaporation, Defect Annealing, and Impurity Diffusion in the III-V Semiconductors -- 5. Diffusion Synthesis of Silicides in Thin-Film Metal-Silicon Structures -- 6. Rapid Thermal Oxidation and Nitridation -- 7. Rapid Thermal Chemical Vapor Deposition -- References.
|
| Abstract
|
:
|
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
|
| Subject
|
:
|
Optical materials.
|
| Added Entry
|
:
|
Hesketh, Peter J.
|
| Added Entry
|
:
|
SpringerLink (Online service)
|
| |