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" Particles on Surfaces 3 "
edited by K. L. Mittal.
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BL
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| Record Number
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575664
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b404883
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| Main Entry
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Mittal, K. L.
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| Title & Author
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Particles on Surfaces 3 : Detection, Adhesion, and Removal /\ edited by K. L. Mittal.
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| Publication Statement
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Boston, MA :: Springer US :: Imprint: Springer,, 1991.
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| ISBN
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9781489923677
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: 9781489923691
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| Contents
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I. Particle-Surface Interactions, Adhesion and General Papers -- Relevance of Surface Energetics to Departiculation of Disk Drive Substrates -- Particle Adhesion to Surface Under Turbulent Flow Conditions -- Modelling Particle Accumulation on a Filter Surface -- Particles in ULSI Grade Chemicals and Their Adhesion to Silicon Surfaces -- Evaluation of Polymeric Materials Used in the Manufacture of Disk Handling Cassettes -- The Release of Particles During Spaceflight -- II. Particle detection, identification, analysis and characterization -- Statistical Aspects of Surface Particle Counting -- Light Scattering by Submicron Spherical Particles on Semiconductor Surfaces -- BRDF Measurements and Mie Scattering Analysis of Spherical Particles on Optical Surfaces -- Identification of Surface Contaminants Using Infrared Micro-profiling -- Analysis of Particles on Surfaces by Total Reflection X-ray Fluorescence Spectrometry -- Characterization of Surface Metal Particulate Contamination Using the Polysilicon Chemical Vapor Deposition Process -- Detection and Subsequent Reduction of Surface Particle Induced Defects on Silicon Wafers -- Isolation and Characterization of Particle Induced Defects from the Lithography Process Using an Electrical Defect Monitor -- III. Particle Reduction and Removal -- Reducing Uncertainties in Particle Adhesion and Removal Measurements -- Particulate and Defect Reduction Strategies for Semiconductor Devices: Tools and Methodologies -- Ultrasonic Cleaning of Surfaces: An Overview -- Particle Protection of Semiconductor Surfaces by Reversible Wafer Bonding and Related Concepts -- Ultra-Clean Air Ionizers for Suppression of Particulate Surface Contamination -- The Cold Jet Process - An Environmentally Sound Alternative for Particles Removal From Advanced Substrates -- Identification and Removal of Storage Induced Particle Contamination on Silicon Wafer Surfaces -- Particle Removal from Oxide, Nitride, and Bare Silicon Surfaces Using Direct-Displacement Isopropyl Alcohol (IPA) Drying -- Elimination of Fretting Wear Particles from the Surface of a Power Cable on a Disk Drive Actuator: A Case Study -- Scanning UV Laser Removal of Contaminants from Semiconductor and Optical Surfaces -- About the Contributors.
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| Subject
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Chemistry.
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Chemistry, inorganic.
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Chemistry, Organic.
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Chemistry, Physical organic.
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Polymers.
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Surfaces (Physics).
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| Added Entry
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SpringerLink (Online service)
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| Parallel Title
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Proceedings of the Third Symposium on Particles on Surfaces held as part of the 21st Annual Meeting of the Fine Particle Society in San Diego, California, August 21-25, 1990
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