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" Particles in Gases and Liquids 2 "
edited by K. L. Mittal.
Document Type
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BL
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Record Number
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575710
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Doc. No
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b404929
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Main Entry
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Mittal, K. L.
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Title & Author
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Particles in Gases and Liquids 2 : Detection, Characterization, and Control /\ edited by K. L. Mittal.
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Publication Statement
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Boston, MA :: Springer US :: Imprint: Springer,, 1990.
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ISBN
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9781489935441
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: 9781489935465
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Contents
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General Overview Papers -- Modeling of Particle Deposition in Cleanroom Environments: Current Status -- Sampling of Airborne Particles for Contamination Assessment -- The Role of Bacterial Biofilms in Contamination of Process Fluids by Biological Particulates -- Describing Filters and Filtration Processes Using the Concepts of Fractal Geometry -- Detection and Control of Particles in Vacuum Environments for Semiconductor Processing -- Operator-Generated Particles: Characterization, Monitoring and Control -- Building and Using an Application-Specific Particle Atlas -- Particulate Cleanliness Testing of Filters and Equipment in Process Fluids (Gas or Liquid) -- Optical Particle Counter Performance Definitions Effects on Submicrometer Particle Measurement -- Particle Generation and Deposition -- Assessing Wiping Materials for their Potential to Contribute Particles to Clean Environments: A Novel Approach -- Robots as a Potential Source of Particulate Contamination -- Particle Release from Surfaces by Mechanical Shocks -- Flowrate Dependence of Particle Shedding from a Gas Delivery Line -- Apparatus for Measuring Ultrafine Particle Emissions from Air Ionization Equipment -- Measurement of Submicrometer Particle Deposition on Silicon Wafers in Cleanroom Environment -- Particles in Gases: Detection, Characterization and Control -- Characterization of Individual Particles in Gaseous Media by Mass Spectrometry -- Characterization of Particles in High-Purity Gases -- Particle Measurement in Gas System Components: Defining a Practical Test Method -- Real-Time Measurement of Particulate Levels in Gases in a Production Diffusion Environment -- In-Situ Particle Monitoring in a Plasma Etcher -- Protected Particle Collection from Gas Streams for Characterization by Analytical Electron Microscopy -- Photoacoustic Detection of Radiation Absorbing Particles in Gases -- Transport of Charged Particles in Gas Streams -- Resolution, Sensitivity, Counting Efficiency, and Coincidence Limit of Optical Aerosol Particle Counters -- Particles in Liquids: Detection Characterization and Control -- Characterization of the Particle Loading in Deionized Water Systems by Automated SEM Analysis -- A Sensitive Monitor for Particles in Liquids -- New Techniques for Sampling Submicron Particle Contamination in Water -- Scaling Laws for Rayleigh Particle Detection in Liquids -- Removal of Particles from Deionized Water in a Recirculating Bath by Etchant Filters -- Modelling of Particle Removal from a Circulating Etch Bath -- Packaging High Purity Chemicals to Ensure Low Particulate Contamination at Point-of-Use.
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Subject
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Chemistry.
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Subject
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Chemistry, Physical organic.
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Added Entry
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SpringerLink (Online service)
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Parallel Title
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Proceedings of the Second Symposium on Particles in Gases and Liquids, held at the 20th Annual Meeting of the Fine Particle Society, in Boston, Massachusetts, August 21-25, 1989
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