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" Predictive Simulation of Semiconductor Processing "
edited by Jarek Dabrowski, Eicke R. Weber.
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BL
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| Record Number
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577748
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b406967
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| Main Entry
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Dabrowski, Jarek.
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| Title & Author
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Predictive Simulation of Semiconductor Processing : Status and Challenges /\ edited by Jarek Dabrowski, Eicke R. Weber.
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| Publication Statement
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Berlin, Heidelberg :: Springer Berlin Heidelberg :: Imprint: Springer,, 2004.
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| Series Statement
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Springer Series in MATERIALS SCIENCE,; 72
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| ISBN
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9783662094327
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: 9783642058042
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| Contents
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Transistors and Atoms -- Atomistic Simulations of Processes at Surfaces -- Atomistic Simulations in Materials Processing -- Atomistic Simulation of Decanano MOSFETs -- Modeling and Simulation of Heterojunction Bipolar Transistors -- Gate Oxide Reliability: Physical and Computational Models -- High-K Dielectrics: The Example of Pr2O3 -- Atomistic Simulation of Si3N4 CVD from Dichlorosilane and NH3 -- Interconnects and Propagation of High Frequency Signals -- Modeling of Electromigration in Interconnects -- Predictive Modeling of Transition Metal Gathering: Applications and Materials Science Challenges.
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| Abstract
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Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
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Mathematical physics.
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Engineering.
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Structural control (Engineering).
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Nanotechnology.
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Surfaces (Physics).
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Weber, Eicke R.
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SpringerLink (Online service)
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