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" Principles of Chemical Vapor Deposition "
by Daniel M. Dobkin, Michael K. Zuraw.
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BL
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| Record Number
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579241
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b408460
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| Main Entry
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Dobkin, Daniel M.
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| Title & Author
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Principles of Chemical Vapor Deposition\ by Daniel M. Dobkin, Michael K. Zuraw.
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| Publication Statement
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Dordrecht :: Springer Netherlands :: Imprint: Springer,, 2003.
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| ISBN
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9789401703697
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: 9789048162772
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| Abstract
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Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
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Chemical engineering.
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Nuclear physics.
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Machinery.
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Surfaces (Physics).
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Zuraw, Michael K.
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SpringerLink (Online service)
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