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" Materials for microlithography : "
L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor
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BL
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| Record Number
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599209
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b428428
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| Title & Author
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Materials for microlithography : : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 /\ L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor
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| Series Statement
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ACS symposium series,; 266
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viii, 494 pages :: illustrations ;; 24 cm
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| ISBN
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0841208719
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: 9780841208711
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| Bibliographies/Indexes
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Includes bibliographical references and indexes
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| Contents
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Fundamental limits of lithography / T.E. Everhart -- Practical and fundamental aspects of lithography / A.N. Broers -- A perspective on resist materials for fine-line lithography / M.J. Bowden -- Fundamental radiation chemistry : fundamental aspects of polymer degradation by high-energy radiation / D.J.T. Hill, J.H. O'Donnell, and P.J. Pomery -- Pulse radiolysis studies on the mechanism of the high sensitivity of chloromethylated polystyrene as an electron negative resist / Y. Tabata, S. Tagawa, and M. Washio -- Photochemistry of ketone polymers in the solid phase : a review / J.E. Guillet, S.-K.L. Li, and H.C. Ng -- Radiolysis of poly(isopropenyl t-butyl ketone) / S.A. Macdonald, H. Ito, C.G. Willson, J.W. Moore, H.M. Gharapetian, and J.E. Guillet -- Polymer-bonded electron-transfer sensitizers / S. Tazuke, R. Takasaki, Y. Iwaya, and Y. Suzuki -- Laser-induced polymerization / C. Decker -- Novel synthesis and photochemical reaction of the polymers with pendant photosensitive and photosensitizer groups / T. Nishikubo, T. Iizawa, and E. Takahashi -- A novel technique for determining radiation chemical yields of negative electron-beam resists / A. Novembre and T.N. Bowmer -- Anomalous topochemical photoreaction of olefin crystals / M. Hasegawa, K. Saigo, and T. Mori -- The photo-Fries rearrangement and its use in polymeric imaging systems / T.G. Tessier, J.M.J. Frechet, C.G. Willson, and H. Ito -- Soluble polysilane derivatives : interesting new radiation-sensitive polymers / R.D. Miller, D. Hofer, D.R. McKean, C.G. Willson, R. West, and P.T. Trefonas, III -- Preparation and resolution characteristics of a novel silicone-based negative resist / A. Tanaka, M. Morita, S. Imamura, T. Tamamura, and O. Kogure -- Positive-working electron-beam resists based on maleic anhydride copolymers / K.U. Pohl, F. Rodriguez, Y.M.N. Namaste, and S.K. Obendorf -- Functionally substituted Novolak resins : lithographic applications, radiation chemistry, and photooxidation / H. Hiraoka -- Synthesis, characterization and lithographic evaluation of chlorinated polymethylstyrene / R. Tarascon, M. Hartney, and M.J. Bowden -- Photochemistry of ketone polymers in the solid phase : thin film studies of vinyl ketone polymers / J.E. Guillet, S.-K.L. Li, S.A. Macdonald, and C.G. Willson -- Polymers of [alpha]-substituted benzyl methacrylates and aliphatic aldehydes as new types of electron-beam resists / K. Hatada, T. Kitayama, Y. Okamoto, H. Yuki, H. Aritome, S. Namba, K. Nate, T. Inoue, and H. Yokono -- Radiation chemistry of phenolic resin containing epoxy and azide compounds / H. Shiraishi, T. Ueno, O. Suga, and S. Nonogaki -- Organic direct optical recording media / L. Alexandru, M.A. Hopper, R.O. Loutfy, J.H. Sharp, P.S. Vincett, G.E. Johnson, and K.Y. Law -- Primary and secondary reactions in photoinitiated free-radical polymerization of organic coatings / A. Hult and B. Ranby -- Radiation stability of silicon elastomers / G.C. Corfield, D.T. Astill, and D.W. Clegg
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| Subject
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Polymers, Congresses
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Photoresists, Congresses
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Microlithography-- Materials, Congresses
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Microelectronics-- Materials, Congresses
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Polymers, Congresses
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Photoresists, Congresses
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Lithography, Congresses
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Microelectronics-- Materials, Congresses
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| Dewey Classification
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621.381/73
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| LC Classification
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TK7871.15.P6M37 1984
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| Added Entry
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Thompson, L. F.,1944-
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Willson, C. G., (C. Grant),1939-
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Fréchet, Jean M. J
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American Chemical Society., Division of Polymeric Materials: Science and Engineering
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American Chemical Society., Division of Polymer Chemistry
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American Chemical Society., Meeting(187th :1984 :, Saint Louis, Mo.)
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| Parallel Title
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Radiation-sensitive polymers
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