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" Polymers in microlithography : "
Elsa Reichmanis, editor, Scott A. MacDonald, editor, Takao Iwayanagi, editor
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BL
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| Record Number
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599338
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b428557
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| Title & Author
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Polymers in microlithography : : materials and processes : developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 197th national meeting of the American Chemical Society, Dallas, Texas, April 9-14, 1989 /\ Elsa Reichmanis, editor, Scott A. MacDonald, editor, Takao Iwayanagi, editor
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| Series Statement
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ACS symposium series,; 412
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xii, 449 pages :: illustrations ;; 24 cm
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| ISBN
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0841217017
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: 9780841217010
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| Bibliographies/Indexes
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Includes bibliographical references and indexes
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| Contents
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Polymers in microlithography : an overview / Elsa Reichmanis and Larry F. Thompson -- Brönsted acid generation from triphenylsulfonium salts in acid-catalyzed photoresist films / D.R. McKean, U. Schaedeli, and Scott A. MacDonald -- Chemically amplified resists : effect of polymer and acid generator structure / Francis M. Houlihan, Elsa Reichmanis, Larry F. Thompson, and Regine G. Tarascon -- Copolymer approach to design of sensitive deep-UV resist systems with high thermal stability and dry etch resistance / Hiroshi Ito, Mitsuru Ueda, and Mayumi Ebina -- Nonswelling negative resists incorporating chemical amplification : the electrophilic aromatic substitution approach / Jean M.J. Fréchet, Stephen Matuszczak, Harald D.H. Stöver, C. Grant Willson, and Berndt Reck -- Acid-catalyzed cross-linking in phenolic-resin-based negative resists / A.K. Berry, K.A. Graziano, L.E. Bogan, Jr., and J.W. Thackeray -- New design for self-developing imaging systems based on thermally labile polyformals / Jean M.J. Fréchet, C. Grant Willson, T. Iizawa, T. Nishikubo, K. Igarashi, and J. Fahey -- Polysilanes : solution photochemistry and deep-UV lithography / R.D. Miller, G. Wallraff, N. Clecak, R. Sooriyakumaran, J. Michl, T. Karatsu, A.J. McKinley, K.A. Klingensmith, and J. Downing -- Syntheses of base-soluble Si polymers and their application to resists / Shuzi Hayase, Rumiko Horiguchi, Yasunobu Onishi, and Toru Ushirogouchi -- Lithographic evaluation of phenolic resin-dimethyl siloxane block copolymers / M.J. Jurek and Elsa Reichmanis -- Preparation of a novel silicone-based positive photoresist and its application to an image reversal process / Akinobu Tanaka, Hiroshi Ban, and Saburo Imamura -- Photooxidation of polymers : application to dry-developed single-layer deep-UV resists / Omkaram Nalamasu, Frank A. Baiocchi, and Gary N. Taylor -- Kinetics of polymer etching in an oxygen glow discharge / Charles W. Jurgensen -- Quantitative analysis of a laser interferometer waveform obtained during oxygen reactive-ion etching of thin polymer films / B.C. Dems, P.D. Krasicky, and F. Rodriguez -- Evaluation of several organic materials as planarizing layers for lithographic and etchback processing / L.E. Stillwagon and Gary N. Taylor -- New negative deep-UV Resist for KrF excimer laser lithography / Masayuki Endo, Yoshiyuki Tani, Masaru Sasago, and Noboru Nomura -- Characterization of a thiosulfate functionalized polymer : a water-soluble photosensitive zwitterion / C.E. Hoyle, D.E. Hutchens, and S.F. Thames -- Pyrimidine derivatives as lithographic materials / Yoshiaki Inaki, Minoo Jalili Moghaddam, and Kiichi Takemoto -- Synthesis of new metal-free diazonium salts and their applications to microlithography / Shou-ichi Uchino, Michiaki Hashimoto, and Takao Iwayanagi -- Photobleaching chemistry of polymers containing anthracenes / James R. Sheats -- Lithography and spectroscopy of ultrathin Langmuir-Blodgett polymer films / S.W.J. Kuan, P.S. Martin, L.L. Kosbar, C.W. Frank, and R.F.W. Pease -- Dissolution of phenolic resins and their blends / J.P. Huang, E.M. Pearce, A. Reiser, and T.K. Kwei -- Solvent concentration profile of poly(methyl methacrylate) dissolving in methyl ethyl ketone : a fluorescence-quenching study / William Limm, Mitchell A. Winnik, Barton A. Smith, and Deirdre T. Stanton -- Molecular studies on laser ablation processes of polymeric materials by time-resolved luminescence spectroscopy / Hiroshi Masuhara, Akira Itaya, and Hiroshi Fukumura -- Mechanism of polymer photoablation explored with a quartz crystal microbalance / Sylvain Lazare and Vincent Granier -- Mechanism of UV- and VUV-induced etching of poly(methyl methacrylate) : evidence for an energy-dependent reaction / Nobuo Ueno, Tsuneo Mitsuhata, Kazuyuki Sugita, and Kenichiro Tanaka
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| Subject
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Polymers, Congresses
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Photoresists, Congresses
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Microlithography-- Materials, Congresses
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| Dewey Classification
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621.381/531
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| LC Classification
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TK7871.15.P6P635 1989
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| Added Entry
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Reichmanis, Elsa,1953-
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MacDonald, Scott A
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Iwayanagi, Takao,1949-
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| Added Entry
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American Chemical Society., Division of Polymeric Materials: Science and Engineering
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American Chemical Society., Meeting(197th :1989 :, Dallas, Tex.)
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