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" High-k gate dielectrics for CMOS technology "
edited by Gang He and Zhaoqi Sun.
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BL
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| Record Number
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608480
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| Doc. No
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dltt
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| Title & Author
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High-k gate dielectrics for CMOS technology\ edited by Gang He and Zhaoqi Sun.
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| Publication Statement
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Weinheim :: Wiley-VCH,, 2012.
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| Page. NO
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xxxi, 558 p. :: ill. (some col.)
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| ISBN
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9783527330324
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9783527646371 (e-book)
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| Bibliographies/Indexes
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Includes bibliographical references and index.
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| Contents
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pt. 1. Scaling and challenging of Si-based CMOS -- pt. 2. High-k deposition and materials characterization -- pt. 3. Challenge in interface engineering and electrode -- pt. 4. Development in non-Si-based CMOS technology -- pt. 5. High-k Application in novel devices -- pt. 6. Challenge and directions.
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| Subject
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Dielectrics.
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Metal oxide semiconductors, Complementary.
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| Dewey Classification
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538.24
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| LC Classification
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QC585.H54 2012eb
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| Added Entry
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He, Gang.
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Sun, Zhaoqi.
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| Added Entry
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ebrary, Inc.
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