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" Total-reflection X-ray fluorescence analysis and related methods "
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BL
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| Record Number
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640695
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dltt
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| Main Entry
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Klockenkämper, Reinhold,1937-
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| Title & Author
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Total-reflection X-ray fluorescence analysis and related methods
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| Edition Statement
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Second edition, thoroughly updated and completely revised // Reinhold Klockenkamper, Alex von Bohlen, Leibniz-Institut für Analytische Wissenschaften, ISAS e.V., Dortmund, Germany
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| Series Statement
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Chemical analysis : a series of monographs on analytical chemistry and its applications ;; volume 181
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| Page. NO
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1 online resource
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| ISBN
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9781118988961 (epub)
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: 1118988965 (epub)
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: 9781118985878 (pdf)
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: 1118985877 (pdf)
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: 9781118985953
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: 1118985958
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9781118460276
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| Bibliographies/Indexes
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Includes bibliographical references and index
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| Contents
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Fundamentals of X-Ray Fluorescence -- A Short History of XRF -- The New Variant TXRF -- Retrospect on its Development -- Relationship of XRF and TXRF -- Nature and Production of X-Rays -- The Nature of X-Rays -- X-Ray Tubes as X Ray Sources -- The Line Spectrum -- The Continuous Spectrum -- Polarization of X-Rays -- Synchrotron Radiation as X-Ray Source -- Electrons in Fields of Bending Magnets -- Radiation Power of a Single Electron -- Angular and Spectral Distribution of SR -- Comparison with Black-Body Radiation -- Attenuation of X-Rays -- Photoelectric Absorption -- X-Ray Scatter -- Total Attenuation -- Deflection of X-Rays -- Reflection and Refraction -- Diffraction and Bragg's Law -- Total External Reflection -- Reflectivity -- Penetration Depth -- Refraction and Dispersion -- References -- Principles of Total Reflection XRF -- Interference of X-Rays -- Double-Beam Interference -- Multiple-Beam Interference -- X-Ray Standing Wave Fields -- Standing Waves in Front of a Thick Substrate -- Standing Wave Fields Within a Thin Layer -- Standing Waves Within a Multilayer or Crystal -- Intensity of Fluorescence Signals -- Infinitely Thick and Flat Substrates -- Granular Residues on a Substrate -- Buried Layers in a Substrate -- Reflecting Layers on Substrates -- Periodic Multilayers and Crystals -- Formalism For Intensity Calculations -- A Thick and Flat Substrate -- A Thin Homogeneous Layer on a Substrate -- A Stratified Medium of Several Layers -- References -- Instrumentation for TXRF and GI-XRF -- Basic Instrumental Setup -- High and Low-Power X-Ray Sources -- Fine-Focus X-Ray Tubes -- Rotating Anode Tubes -- Air-Cooled X-Ray Tubes -- Synchrotron Facilities -- Basic Setup with Bending Magnets -- Undulators, Wigglers, and FELs -- Facilities Worldwide -- The Beam Adapting Unit -- Low-Pass Filters -- Simple Monochromators -- Double-Crystal Monochromators -- Sample Positioning -- Sample Carriers -- Fixed Angle Adjustment for TXRF ("Angle Cut") -- Stepwise-Angle Variation for GI-XRF ("Angle Scan") -- Energy-Dispersive Detection of X-Rays -- The Semiconductor Detector -- The Silicon Drift Detector -- Position Sensitive Detectors -- Wavelength-Dispersive Detection of X-Rays -- Dispersing Crystals with Soller Collimators -- Gas-Filled Detectors -- Scintillation Detectors -- Spectra Registration and Evaluation -- The Registration Unit -- Performance Characteristics -- Detector Efficiency -- Spectral Resolution -- Input-Output Yield -- The Escape-Peak Phenomenon -- References -- Performance of TXRF and GI-XRF Analyses -- Preparations for Measurement -- Cleaning Procedures -- Preparation of Samples -- Presentation of a Specimen -- Microliter Sampling by Pipettes -- Nanoliter Droplets by Capillaries -- Picoliter-Sized Droplets by Inkjet Printing -- Microdispensing of Liquids by Triple-Jet Technology -- Solid Matter of Different Kinds -- Acquisition of Spectra -- The Setup for Excitation with X-Ray Tubes -- Excitation by Synchrotron Radiation -- Recording the Spectrograms -- Energy-Dispersive Variant -- Wavelength-Dispersive Mode -- Qualitative Analysis -- Shortcomings of Spectra -- Strong Spectral Interferences -- Regard of Sum Peaks -- Dealing with Escape Peaks -- Unambiguous Element Detection -- Fingerprint Analysis -- Quantitative Micro- and Trace Analyses -- Prerequisites for Quantification -- Determination of Net Intensities -- Determination of Relative Sensitivities -- Quantification by Internal Standardization -- Standard Addition for a Single Element -- Multielement Determinations -- Conditions and Limitations -- Mass and Thickness of Thin Layers -- Residues of Microliter Droplets -- Coherence Length of Radiation -- Quantitative Surface and Thin-Layer Analyses by TXRF -- Distinguishing Between Types of Contamination -- Bulk-Type Impurities -- Particulate Contamination -- Thin-Layer Covering -- Mixture of Contaminations -- Characterization of Thin Layers by TXRF -- Multifold Repeated Chemical Etching -- Stepwise Repeated Planar Sputter Etching -- Quantitative Surface and Thin-Layer Analyses by GI-XRF -- Recording Angle-Dependent Intensity Profiles -- Considering the Footprint Effect -- Regarding the Coherence Length -- Depth Profiling at Grazing Incidence -- Including the Surface Roughness -- References -- Different Fields of Applications -- Environmental and Geological Applications -- Natural Water Samples -- Airborne Particulates -- Biomonitoring -- Geological Samples -- Biological and Biochemical Applications -- Beverages: Water, Tea, Coffee, Must, and Wine -- Vegetable and Essential Oils -- Plant Materials and Extracts -- Unicellular Organisms and Biomolecules -- Medical, Clinical, and Pharmaceutical Applications -- Blood, Plasma, and Serum -- Urine, Cerebrospinal, and Amniotic Fluid -- Tissue Samples -- Freeze-Cutting of Organs by a Microtome -- Healthy and Cancerous Tissue Samples -- Medicines and Remedies -- Industrial or Chemical Applications -- Ultrapure Reagents -- High-Purity Silicon and Silica -- Ultrapure Aluminum -- High-Purity Ceramic Powders -- Impurities in Nuclear Materials -- Hydrocarbons and Their Polymers -- Contamination-Free Wafer Surfaces -- Wafers Controlled by Direct TXRF -- Contaminations Determined by VPD-TXRF -- Characterization of Nanostructured Samples -- Shallow Layers by Sputter Etching and TXRF -- Thin-Layer Structures by Direct GT-XRF -- Nanoparticles by TXRF and GI-XRF -- Art Historical and Forensic Applications -- Pigments, Inks, and Varnishes -- Metals and Alloys -- Textile Fibers and Glass Splinters -- Drug Abuse and Poisoning -- References -- Efficiency and Evaluation -- Analytical Considerations -- General Costs of Installation and Upkeep -- Detection Power for Elements -- Reliability of Determinations -- The Great Variety of Suitable Samples -- Round-Robin Tests -- Utility and Competitiveness of TXRF and GI-XRF -- Advantages and Limitations -- Comparison of TXRF with Competitors -- GI-XRF and Competing Methods -- Perception and Propagation of TXRF Methods -- Commercially Available Instruments -- Support by the International Atomic Energy Agency -- Worldwide Distribution of TXRF and Related Methods -- Standardization by ISO and DIN -- International Cooperation and Activity -- References -- Trends and Future Prospects -- Instrumental Developments -- Excitation by Synchrotron Radiation -- New Variants of X-Ray Sources -- Capillaries and Waveguides for Beam Adapting -- New Types of X-Ray Detectors -- Methodical Developments -- Detection of Light Elements -- Ablation and Deposition Techniques -- Grazing Exit X-Ray Fluorescence -- Reference-Free Quantification -- Time-Resolved In Situ Analysis -- Future Prospects by Combinations -- Combination with X-Ray Reflectometry -- EXAFS and Total Reflection Geometry -- Combination with XANES or NEXAFS -- X-Ray Diffractometry at Total Reflection -- Total Reflection and X-Ray Photoelectron Spectrometry -- References
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| Subject
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X-ray spectroscopy.
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| Subject
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Fluorescence spectroscopy.
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| Dewey Classification
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543/.62
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| LC Classification
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QD96.X2
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| Added Entry
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Bohlen, Alex von,1954-
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Ohio Library and Information Network.
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