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" Ionized physical vapor deposition / "
edited by Jeffrey A. Hopwood.
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BL
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| Record Number
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653198
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| Doc. No
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dltt
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| Title & Author
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Ionized physical vapor deposition /\ edited by Jeffrey A. Hopwood.
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| Publication Statement
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San Diego :: Academic Press,, c2000.
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| Series Statement
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Thin films ;; v. 27
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| Page. NO
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xii, 253 p. :: ill. ;; 24 cm.
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| ISBN
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0125330278
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: 9780125330275
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| Bibliographies/Indexes
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Includes bibliographical references and indexes.
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| Contents
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The role of ionized physical vapor deposition in integrated circuit fabrication / Jeffrey A. Hopwood -- High-density plasma sources / Amy E. Wendt -- Ionization by radio freguency inductively coupled plasma / Steve Rossnagel -- Ionization by microwave electron cyclotron resonance plasma / William M. Holber -- Ionized hollow cathode magnetron sputtering / Kwok F. Lai -- Applications and properties of ionized physical vapor deposition films / John Forster -- Plasma physics / Jeffrey A. Hopwood -- Numerical modeling / Ming Li, Michael A. Vyvoda, and David B. Graves.
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| Subject
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Thin film devices-- Design and construction.
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| Subject
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Physical vapor deposition.
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| Subject
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Thin films.
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| LC Classification
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QC176.A1P53 v.27
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| Added Entry
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Hopwood, Jeffrey A.
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