رکورد قبلیرکورد بعدی

" Handbook of cleaning for semiconductor manufacturing : "


Document Type : BL
Record Number : 657497
Doc. No : dltt
Main Entry : Reinhardt, Karen A
Title & Author : Handbook of cleaning for semiconductor manufacturing : : fundamentals and applications /\ Karen A. Reinhardt, Richard F. Reidy
Publication Statement : Salem, Mass. :Scrivener ;Hoboken, N.J. :: John Wiley & Sons, Inc.,, c2011
Page. NO : xxii, 590 p. :: ill. ;; 26 cm
ISBN : 9780470625958
: : 0470625953
: : 9781118071748 (electronic bk.)
: : 1118071743 (electronic bk.)
Bibliographies/Indexes : Includes bibliographical references and index
Contents : Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt -- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski -- Aluminum Interconnect Cleaning and Drying / David J Maloney -- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank -- Wafer Reclaim / Michael B Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdil̈s, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar
Subject : Semiconductors-- Surfaces-- Cleaning
LC Classification : ‭QC611.6.S9‬‭R456 2011‬
Added Entry : Reidy, Richard F.,1960-
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