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" Handbook of plasma processing technology "
edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
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BL
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| Record Number
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673942
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| Doc. No
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b503131
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| Title & Author
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Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /\ edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
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| Publication Statement
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Park Ridge, N.J. :: Noyes Publications,, c1990.
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| Series Statement
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Materials science and process technology series.
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| Page. NO
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1 online resource (xxiii, 523 p.) :: ill.
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| ISBN
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0815512201
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: 1591242975 (electronic bk.)
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: 9780815512202
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: 9781591242970 (electronic bk.)
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| Bibliographies/Indexes
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Includes bibliographical references and index.
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| Abstract
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An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
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| Subject
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Plasma engineering.
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| Subject
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Plasma etching.
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Semiconductors-- Etching.
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| Dewey Classification
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621.044
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| LC Classification
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TA2020.H37 1990eb
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| Added Entry
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Cuomo, J. J.
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Rossnagel, Stephen M.
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Westwood, William D., (William Dickson),1937-
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Knovel (Firm)
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