رکورد قبلیرکورد بعدی

" Handbook of plasma processing technology "


Document Type : BL
Record Number : 673942
Doc. No : b503131
Title & Author : Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /\ edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
Publication Statement : Park Ridge, N.J. :: Noyes Publications,, c1990.
Series Statement : Materials science and process technology series.
Page. NO : 1 online resource (xxiii, 523 p.) :: ill.
ISBN : 0815512201
: : 1591242975 (electronic bk.)
: : 9780815512202
: : 9781591242970 (electronic bk.)
Bibliographies/Indexes : Includes bibliographical references and index.
Abstract : An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Subject : Plasma engineering.
Subject : Plasma etching.
Subject : Semiconductors-- Etching.
Dewey Classification : ‭621.044‬
LC Classification : ‭TA2020‬‭.H37 1990eb‬
Added Entry : Cuomo, J. J.
: Rossnagel, Stephen M.
: Westwood, William D., (William Dickson),1937-
Added Entry : Knovel (Firm)
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