| Document Type
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BL
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| Record Number
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714733
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b536884
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| Main Entry
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by Donald M. Mattox.
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| Title & Author
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Handbook of physical vapor deposition (PVD) processing : : film formation, adhesion, surface preparation and contamination control\ by Donald M. Mattox.
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| Publication Statement
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Westwood, N.J.: Noyes Publications, ©1998.
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| Page. NO
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(xxvii, 945 pages) : illustrations
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| ISBN
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0815517610
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: 9780815517610
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| Contents
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Preface"; "Contributors"; "Table of Contents"; "1 INTRODUCTION"; "2 SILICIDES AND CONTACTS FOR ULSI"; "3 ALUMINUM BASED MULTILEVEL METALLIZATIONS IN VLSI/ULSICs"; "4 INORGANIC DIELECTRICS"; "5 ORGANIC DIELECTRICS IN MULTILEVEL METALLIZATION OF INTEGRATED CIRCUITS"; "6 PLANARIZATION TECHNIQUES"; "7 LITHOGRAPHY AND ETCH ISSUES FOR A MULTILEVEL METALLIZATION SYSTEM"; "8 ELECTRO- AND STRESS MIGRATION IN MLM INTERCONNECT STRUCTURES"; "9 MULTILEVEL METALLIZATION TEST VEHICLE"; "10 MANUFACTURING AND ANALYTIC METHODS" "11 characterization techniques for vlsi multilevel metallization""12 electronic packaging and its influences on integrated circuit design and processing"; "13 future interconnect systems"; "index"
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| Abstract
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Covers various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. This book also covers substrate characterization, adhesion, cleaning and processing.
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| Subject
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Physical vapor deposition -- Handbooks, manuals, etc.
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| Subject
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Physical vapor deposition.
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| Subject
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TECHNOLOGY ENGINEERING -- Technical Manufacturing Industries Trades.
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| Added Entry
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D M Mattox
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