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" Materials Modification by High-fluence Ion Beams "
edited by Roger Kelly, M. Fernanda Silva.
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BL
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772606
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b592600
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| Main Entry
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edited by Roger Kelly, M. Fernanda Silva.
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| Title & Author
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Materials Modification by High-fluence Ion Beams\ edited by Roger Kelly, M. Fernanda Silva.
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| Publication Statement
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Dordrecht : Springer Netherlands, 1989
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| Series Statement
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NATO ASI series., Series E,, Applied sciences ;, 155.
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(606 pages)
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| ISBN
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9400912676
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: 9789400912670
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| Contents
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Overview --; High-fluence ion irradiation: an overview --; Sputtering --; Historical overview on the fundamentals of sputtering --; Depth of origin of sputtered atoms --; Magnetron sputtering: physics and design --; On the formation and characterization of microcrystalline Si:H prepared by RF magnetron sputtering --; Depth profiling of Ta2O5 thin layer on Ta foil by ion scattering spectrometry and ion sputtering --; Bombardment of alkali and alkali-earth halides by ions and electrons --; Effects of Ar+ angle-of-incidence on the etching of Si with Cl2 and low-energy Ar+ ions --; Irradiation effects in ices by energetic ions --; Ion formation by very high energetic ion impact on solids --; Simulation --; Computer simulation of stopping and sputtering --; Computer simulation of ion-beam mixing of cobalt on silicon --; On the fractal nature of collision cascades --; Simple statistical models for erosion and growth --; Defects and Disorder --; Defects and defect processes --; Fast-ion-induced defects in silicon studied by deep level transient spectroscopy --; Low-energy (300 eV --; 10 keV) Ar+ and Cl+ ion irradiation of (100) Si --; The charge state of iron implanted into sapphire --; Implantation and Mixing --; Direct and recoil implantation, and collisional ion-beam mixing: recent low-temperature experiments --; Mixing by defect-assisted migration of thin markers in solids --; The TRIUMF optically pumped polarized H- ion source --; Some high-current ion sources for materials modification --; Compositional and Chemical Changes --; Bombardment-induced compositional change with alloys, oxides, and oxysalts. I The role of the surface binding energy --; Investigation of preferential sputtering mechanisms by analysing the sample surface and near-surface region with AES and ISS --; High-fluence implantation in insulators. Part I: Compositional, mechanical, and optical changes --; High-fluence implantation in insulators. Part II: Chemical changes --; Electrochemical and corrosion behaviour of ion and laser-beam modified metal surfaces --; Structural Changes --; Ion-irradiation induced phase changes in metallic systems --; The topography of ion-bombarded surfaces --; Cultured blisters --; Electronic Changes --; Electronic properties of ion-implanted metals --; Mechanical Changes --; Tribology of implantation bilayers --; Adhesive and abrasive wear study of nitrogen implanted steels --; Effect of?-recoil damage on the elastic moduli of zircon and tourmaline --; Depth-resolved investigation of structural transformations and hardness variations in implanted films on bulk samples --; Laser Processing --; Laser etching as an alternative --; Pulsed laser irradiation of heavily Ge implanted silicon.
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Computer engineering.
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Surfaces (Physics)
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M Fernanda Silva
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Roger Kelly
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| Parallel Title
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Proceedings of the NATO Advanced Study Institute on Materials Modification by High-Fluence Ion Beams, Viana do Castelo, Portugal, August 24-September 4, 1987
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