| Document Type
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BL
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| Record Number
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946705
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| Doc. No
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b701075
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| Main Entry
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Okoroanyanwu, Uzodinma.
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| Title & Author
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Chemistry and lithography /\ Uzodinma Okoroanyanwu.
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| Publication Statement
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Bellingham, Wash. :: SPIE Press ;Hoboken, N.J. :: Wiley,, ©2010.
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| Series Statement
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Press monograph ;; 192
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| Page. NO
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xxix, 861 pages :: illustrations ;; 26 cm.
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| ISBN
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0819475629
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: 1118030028
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: 9780819475626
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: 9781118030028
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| Bibliographies/Indexes
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Includes bibliographical references and index.
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| Contents
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Part I: Origins, inventions, and the evolution of lithography. 1. Introduction to lithography -- 2. Invention of lithography and photolithography -- 3. Optical and chemical origins of lithography -- 4. Evolution of lithography.
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Part II: Lithographic chemicals. 5. Lithographic chemicals -- 6. Negative resists -- 7. Positive resists -- 8. General considerations on the radiation and photochemistry of resists -- 9. Antireflection coatings and reflectivity control.
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Part III: The practice of lithography. 10. Stone, plate, and offset lithography -- 11. The semiconductor lithographic process -- 12. Lithographic modeling -- 13. Optical lithography -- 14. X-ray and extreme-ultraviolet lithographies -- 15. Charged particle lithography -- 16. Lithography in integrated circuit device fabrication -- 17. Advanced resist processing and resist resolution limit issues -- Afterword -- Index.
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| Abstract
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This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.
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| Subject
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Chemistry, Technical.
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| Subject
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Lithography.
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| Subject
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Chemistry, Technical.
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| Subject
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Lithography.
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| Subject
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Chemie.
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| Subject
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Chemie.
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| Subject
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Lithographie.
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| Subject
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Lithographie.
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| Dewey Classification
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621.3815/31
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| LC Classification
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NE2425.O38 2010
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| NLM classification
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VE 6300rvk
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| Added Entry
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Society of Photo-optical Instrumentation Engineers.
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